METHOD FOR ADJUSTMENT OF ATMOSPHERE OF N2 SEALING IN SEMICONDUCTOR INDUSTRY WORKSHOP

摘要

PURPOSE:To enable to cut down the amount of expensive liquid nitrogen consumed as well as to contrive economy in the running cost by a method wherein the N2 contained in the atmospheric gas exhausted from the workshop where N2-sealed for semiconductor industry is refined by performing an absorbing and detaching processes. CONSTITUTION:The N2 contained in an atmospheric gas is absorbed by passing the atmospheric gas containing O2 as impurities through the absorbing tower wherein one or more kinds of natural tuff, processed natural tuff, semisynthetic zeolite and synthetic zerolite are filled as an absorbing agent. Then, high purity N2 gas is brought out by detaching the N2 which is absorbed to the absorbing material using the pressure which is lower than that used when it is absorbed, and this N2 gas is returned to the workshop. The absorption and isolation operation of N2 using absorbing material can be performed following general absorbing technique, but desirably, two or more absorbing towers wherein absorbing material is filled are to be used in such a manner that while an absorbing operation and a detaching operation are alternately performed, thereby enabling to conduct a continuous processing.