首页> 外国专利> TRIVALENT CHROMIUM ELECTROLYTES CONTAINING THIAZOLE COMPOUNDS

TRIVALENT CHROMIUM ELECTROLYTES CONTAINING THIAZOLE COMPOUNDS

机译:含噻唑化合物的三价铬电解质

摘要

An improved aqueous acidic trivalent chromium electrolyte and process for increasing the tolerance of such electrolytes to the presence of deleterious contaminating metal ions which normally progressively increase during commercial operation of the electrolyte ultimately resulting in chromium electrodeposits which are commercially unsatisfactory due to the presence of streaks, clouds and hazes in the deposit. The improved composition contains controlled effective amounts of thiazole and benzothiazole compounds which are effective to mask the adverse effects of such contaminating metal impurities and which also enhance the codeposition of such metal contaminants on the parts being plated thereby reducing, and in some instances preventing the progressive accumulation of such contaminating metal ions in the electrolyte. The invention further encompasses the process of rejuvenating trivalent chromium electrolytes which have been rendered deficient in their ability to deposit satisfactory chromium platings by a controlled addition of such additive agents followed by electrolyzing of the electrolyte to progressively reduce the concentration of contaminating metal ions to a level in which satisfactory performance of the electrolyte is restored.
机译:一种改进的酸性三价铬水溶液,以及用于增加这种电解质对有害污染金属离子的耐受性的方法,该金属污染物通常在电解质的商业操作过程中逐渐增加,最终导致铬电沉积,由于存在条纹,商业上不能令人满意,矿床中有云和阴霾。改进的组合物含有可控制的有效量的噻唑和苯并噻唑化合物,它们可有效地掩盖这种污染性金属杂质的不利影响,并且还可以增强此类金属污染物在被镀部件上的共沉积,从而减少并在某些情况下防止腐蚀。这种污染性金属离子在电解质中的积累。本发明还包括使三价铬电解质再生的方法,该三价铬电解质通过控制添加这些添加剂而使电解质沉积以逐渐将污染金属离子的浓度降低到一定水平而使其沉积令人满意的铬镀层的能力不足。其中电解质恢复令人满意的性能。

著录项

  • 公开/公告号AU544982B2

    专利类型

  • 公开/公告日1985-06-27

    原文格式PDF

  • 申请/专利权人 OCCIDENTAL CHEMICAL CORP.;

    申请/专利号AU19830017128

  • 发明设计人 ROBERT A. TREMMEL;

    申请日1983-07-20

  • 分类号C25D3/06;C25D3/10;

  • 国家 AU

  • 入库时间 2022-08-22 08:04:15

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