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Semiconductor integrated circuit device having a high tolerance of abnormal high input voltages

机译:具有对异常高输入电压的高容忍度的半导体集成电路装置

摘要

PURPOSE:To prevent the damage of an MIS element due to extraordinarily high voltage without loss of the integration and the characteristics by connecting an external terminal through a diffused region to the element and increasing the withstand voltage of the element higher than that of the diffused region. CONSTITUTION:When an input is connected to the gate electrode 1 of an FET in an MOS circuit, an input resistor 11 made of diffused region is inserted and connected between an external terminal 10 and the gate electrode 1. The gate insulating film of the input FET is increased in thickness to become higher than the withstand voltage (the breakdown voltage of the junction) of the resistor 11 at the withstand voltage. When it is inputted to the source region 5' of the FET, a source electrode 2 is connected to a resistor 13, the source junction of the input FET is deeper in depth than the FET of the internal circuit, and the channel region 4' is increased in length. Thus, it can prevent the damage of the FET due to extraordinarily high input voltage without specific protecting circuit.
机译:目的:为防止MIS元件因极高的电压而损坏,而不会损失集成度和特性,方法是通过扩散区域将外部端子连接到元件上,并使元件的耐压高于扩散区域。组成:当输入连接到MOS电路中FET的栅电极1时,由扩散区制成的输入电阻器11插入并连接在外部端子10和栅电极1之间。输入的栅绝缘膜FET的厚度增加以变得高于在耐受电压下的电阻器11的耐受电压(结的击穿电压)。当将其输入到FET的源极区域5'时,源极电极2连接到电阻器13,输入FET的源极结的深度比内部电路的FET和沟道区域4'的深度深。长度增加。因此,无需特别的保护电路,就可以防止因输入电压过高而损坏FET。

著录项

  • 公开/公告号EP0043284B1

    专利类型

  • 公开/公告日1985-04-24

    原文格式PDF

  • 申请/专利权人 FUJITSU LIMITED;

    申请/专利号EP19810302974

  • 发明设计人 MIYASAKA KIYOSHI;

    申请日1981-06-30

  • 分类号H01L29/06;H01L21/225;H03K17/08;

  • 国家 EP

  • 入库时间 2022-08-22 08:03:29

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