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Deposition of coatings upon substrates utilising a high pressure, non-local thermal equilibrium arc plasma
Deposition of coatings upon substrates utilising a high pressure, non-local thermal equilibrium arc plasma
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机译:利用高压,非局部热平衡电弧等离子体在基材上沉积涂层
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摘要
A process for the coating of a substrate characterised in that it comprises:generating a non-LTE arc plasma at a pressure of greater than 0.1 atmospheres;introducing a coating material into the arc plasma; andpositioning a substrate proximate to the arc plasma, activated species of the coating material formed by the arc plasma contacting the substrate to form a coating is disclosed.In certain embodiments of the present process, a semiconductor or a photovoltaic semiconductor may be produced. The present invention offers advantages over the prior art.展开▼