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Deposition of yttria-stabilized zirconia thermal barrier coatings by laser-assisted plasma coating at atmospheric pressure

机译:在常压下通过激光辅助等离子涂层沉积氧化钇稳定的氧化锆热障涂层

摘要

This thesis details the design and construction of a microwave generation system, and a coaxial cylindrical plasma torch, where an atmospheric-pressure plasma (APP) can be generated using 2.45 GHz. The discharge characteristics of the atmospheric plasma, such as electron temperature Te, electron density ne, and plasma gas temperature Tg, are experimentally investigated using the optical emission spectroscopy (OES) technique. The discharge mechanisms of the atmospheric pressure plasma are also theoretically discussed. The APP generated in the atmospheric-pressure plasma torch (APPT) has various applications determined by the plasma gas type and plasma gas temperature, which can range from room temperature to as high as several thousand degrees Celsius. In this study, the APP is utilized to deposit the yttria-stabilized zirconia (YSZ) thermal barrier coatings (TBC) at atmosphere pressure. These coatings can be applied on silicon wafers, and multi-layer nickel-based superalloy substrates (Ren?? N5), by a new deposition technique called laser-assisted plasma coating at atmospheric pressure (LAPCAP). The plasma generated in the APPT has the potential to increase the vapor volume ablated from the YSZ target by a Nd:YAG laser, therefore, adhesion strength between the coatings and the substrate and deposition rate can be increased. The deposited YSZ coatings show columnar structures as can be seen by other deposition methods, such as electron beam-physical vapor deposition (EB-PVD) or the conventional pulsed laser deposition (PLD) at low pressure. Some differences in the morphology, such as column size and porosity, are compared with the coatings deposited by EB-PVD and low-pressure PLD. The substrate temperature, the target-to-substrate distance and the laser ablation energy density are considered to be the determining parameters in order to obtain thick and adhesive coatings. The structures of the YSZ coatings deposited at different substrate temperatures from 20 ??C to 1300 ??C using helium/nitrogen plasma, were investigated and compared by means of scanning electron microscope (SEM) and focused ion beam (FIB) techniques. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) analysis have showed that although a fully stabilized cubic phase YSZ coating can be achieved at different deposition temperatures with appropriate laser energy density, the microstructures, stoichiometry and phase composition of the deposited coatings can be strongly influenced by many experimental parameters, such as the deposition temperature, microwave power and laser energy density.
机译:本文详细介绍了微波发生系统和同轴圆柱形等离子炬的设计与构造,其中可以使用2.45 GHz产生大气压等离子体(APP)。使用光发射光谱法(OES),通过实验研究了大气等离子体的放电特性,例如电子温度Te,电子密度ne和等离子体气体温度Tg。理论上也讨论了大气压等离子体的放电机理。在大气压等离子炬(APPT)中生成的APP具有各种应用,这些应用由等离子气体类型和等离子气体温度决定,其范围从室温到高达几千摄氏度。在这项研究中,APP用于在大气压下沉积氧化钇稳定的氧化锆(YSZ)热障涂层(TBC)。通过一种称为大气压下激光辅助等离子体涂层的新沉积技术,可以将这些涂层涂覆在硅片和多层镍基高温合金衬底上(Ren ?? N5)。 APPT中产生的等离子体具有增加Nd:YAG激光从YSZ靶烧蚀掉的蒸气量的潜力,因此,可以提高涂层与基材之间的粘附强度以及沉积速率。沉积的YSZ涂层显示出柱状结构,可以通过其他沉积方法看到,例如在低压下进行电子束物理气相沉积(EB-PVD)或常规脉冲激光沉积(PLD)。将某些形态上的差异(例如柱尺寸和孔隙率)与EB-PVD和低压PLD沉积的涂层进行了比较。基板温度,目标到基板的距离和激光烧蚀能量密度被认为是确定参数,以便获得厚而粘的涂层。利用扫描电子显微镜(SEM)和聚焦离子束(FIB)技术研究和比较了在20℃至1300℃的不同基材温度下使用氦/氮等离子体沉积的YSZ涂层的结构。 X射线光电子能谱(XPS)和X射线衍射(XRD)分析表明,尽管在适当的激光能量密度下,可以在不同的沉积温度下获得完全稳定的立方相YSZ涂层,但其微观结构,化学计量和相组成沉积的涂层会受到许多实验参数的强烈影响,例如沉积温度,微波功率和激光能量密度。

著录项

  • 作者

    Ouyang Zihao;

  • 作者单位
  • 年度 2011
  • 总页数
  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
  • 中图分类

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