首页> 外国专利> Process for preparing relief images in imaged irradiated light- sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development

Process for preparing relief images in imaged irradiated light- sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development

机译:通过热空气处理,整体辐照和碱显影在具有酸可裂解化合物的成像辐照光敏材料中制备浮雕图像的方法

摘要

A process is described for preparing relief images, in which a light- sensitive material composed of a support and a light-sensitive layer which contains as essential constituentsPP(a) a compound which has at least one C-O-C bond which is cleavable by acid, P P(b) a compound which forms a strong acid on irradiation andP P(c) a binder which is insoluble in water and soluble in aqueous- alkaline solutions is imagewise irradiated, warmed to an elevated temperature, cooled down and then irradiated over its entire area, whereafter those parts of the layer which have not been imagewise irradiated are then washed out by developing. The process makes it possible to prepare positive or negative copies by means of the same light-sensitive material in a simple way.
机译:描述了一种制备浮雕图像的方法,其中由支撑体和光敏层组成的光敏材料包含作为基本成分的P

(a)具有至少一个COC键的化合物,该化合物具有可以通过酸裂解,

(b)是在照射时形成强酸的化合物,而

(c)以图像方式照射了不溶于水但溶于碱水溶液的粘合剂将其加热至升高的温度,冷却,然后在其整个区域上进行辐照,此后,通过显影将层中未被成像辐照的那些部分冲洗掉。该方法使得可以通过相同的光敏材料以简单的方式制备正片或负片。

著录项

  • 公开/公告号US4506006A

    专利类型

  • 公开/公告日1985-03-19

    原文格式PDF

  • 申请/专利权人 HOECHST AKTIENGESELLSCHAFT;

    申请/专利号US19820449739

  • 发明设计人 HANS RUCKERT;

    申请日1982-12-14

  • 分类号G03C7/26;G03C7/00;

  • 国家 US

  • 入库时间 2022-08-22 07:52:58

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