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CRUCIBLE FOR PULLING SEMICONDUCTOR CRYSTAL AND METHOD FOR PULLING SEMICONDUCTOR CRYSTAL USING SAID CRUCIBLE
CRUCIBLE FOR PULLING SEMICONDUCTOR CRYSTAL AND METHOD FOR PULLING SEMICONDUCTOR CRYSTAL USING SAID CRUCIBLE
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机译:用于拉拔半导体晶体的坩埚和使用所述坩埚拉拔半导体晶体的方法
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摘要
PURPOSE:To prevent damage of an inside wall of a crucible and to prepare economically a Group III-V compound semiconductor single crystal having low thermal strain and high quality by using a specified crucible comprising a main crucible and an auxiliary crucible and pulling a semiconductor crystal using the crucible. CONSTITUTION:A crucible for pulling a semiconductor crystal is contructed by fitting loosely a main crucible 9 made of BN having a height l to the inside of a quartz auxiliary crucible 10 having a longer height l'. Then, a Group III metal, i.e. Gal and a Group V metal, i.e. As 2 are charged to the main crucible 9, and a liquid sealing material B2O3 4 is charged to the auxiliary crucible 10. The crucible is heated at 1,240 deg.C to fill the main cruckble 9 with GaAs melt 5 and the auxiliary crucible 10 with the sealing material 4'. A single crystal is formed in the B2O3 4' in the auxiliary crucible 10 by dipping a seed crystal 6 in the GaAs melt in the main crucible 9. After a long sized crystal 7 is formed, the crystal is separated from residual GaAs melt 5 and cooled slowly, then pulled out of the auxiliary crucible 10 while keeping the upper surface of the liquid sealing material B2O3 4' to remain in the auxiliary crucible 10.
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机译:目的:为了防止损坏坩埚的内壁,并通过使用包括主坩埚和辅助坩埚的指定坩埚并拉出半导体晶体,经济地制备具有低热应变和高质量的III-V族化合物半导体单晶使用坩埚。组成:拉制半导体晶体的坩埚是通过将高度为l的BN制成的主坩埚9松散地安装在高度为l'的石英辅助坩埚10的内部来构造的。然后,将III族金属即Gal和V族金属即As 2装入主坩埚9中,并将液体密封材料B 2 O 3 4装入辅助坩埚10中。将坩埚加热至1240℃。用GaAs熔体5填充主坩埚9,并用密封材料4'填充辅助坩埚10。通过将晶种6浸入主坩埚9中的GaAs熔体中,在辅助坩埚10中的B2O3 4'中形成单晶。在形成长尺寸的晶体7之后,将晶体与残留的GaAs熔体5分离,缓慢冷却,然后从辅助坩埚10中拉出,同时保持液体密封材料B2O3 4'的上表面保留在辅助坩埚10中。
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