DEPOSIT FILM FORMING DEVICE USING PHOTOCHEMICAL VAPOR DEPOSITION METHOD

摘要

PURPOSE:To prevent the reduction in light permeability due to the deposit film on a light transmission window by a method wherein a means to introduce a gas without deposition property and the shape of the reaction container or the flow rate of gas B is set so that a specific relation is established. CONSTITUTION:A reaction container 3 having a reaction space that is sealed and formed inside, a light transmission window 2 that is made by cutting a part of the upper wall of the reaction container 3 are provided. Then, a means 8, 9 to introduce a gas B that cannot form a deposit film only with a radiation of light near the light transmission window 2, a means 4, 5 to introduce a gas A that can form a deposit film with the reaction container, and a means to discharge the inside of the reaction container are provided. When it is assumed that the distance between the light transmission window and the introduction section of the material gas A is l, the cross-sectional area of the reaction space vertical to the direction where the material gas B flows between the light transmission window and the introduction section of the gas A is W, the flowing amount of the gas B is Q, the temperature of the gas B is T. [K], and the ratio between the illuminance of the light at the position of the light permination window and the illuminance of the light at the position of the substrate body is ro, the relation of the expression I shall hold.