CAPACITANCE HEIGHT GAUGE AND RETICLE POSITION SENSOR FOR ELECTRON BEAM LITHOGRAPHY

摘要

In an electron beam lithography apparatus a capacitance height gauge is used to determine the distance between a reticule and electron optics. In order to calibrate the capacitance gauge an optical interferometer, including a mirror are mounted on the same axis as the capacitance gauge. The mirror is moved a predetermined distance so that the movement distance measured by the capacitance gauge and the interferometer can be compared.