Method for the deposition chemistry in the vapor phase, at low temperature and low pressure of layer (s) of silicon epitaxial (AIS)

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  机译： 外延硅层的低温低压化学气相沉积的方法和设备

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  机译： 低温，低压化学气相沉积硅外延硅层的方法和装置

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• 1. Low Pressure Chemical Vapor Deposition of TiOsub2/subLayer in Hydrogen-Ambient [J] . Satoshi Yamauchi ,Kazuhiro Ishibashi ,Sakura Hatakeyama . 结晶过程及技术期刊（英文） . 2014,第4期
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• 3. Room Temperature and Reduced Pressure Chemical Vapor Deposition of Silicon Carbide on Various Materials Surface [J] . Hitoshi Habuka ,Asumi Hirooka ,Kohei Shioda . 化学工程与科学期刊（英文） . 2014,第4期
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• 6. 化学气相沉积生长碳化硅外延层的数值模拟 [A] . 黄海泉 . 2020