首页> 外国专利> SEMICONDUCTOR DEVICE HAVING RAPID REMOVAL OF MAJORITY CARRIERS FROM AN ACTIVE BASE REGION THEREOF AT DEVICE TURN-OFF AND METHOD OF FABRICATING THIS DEVICE

SEMICONDUCTOR DEVICE HAVING RAPID REMOVAL OF MAJORITY CARRIERS FROM AN ACTIVE BASE REGION THEREOF AT DEVICE TURN-OFF AND METHOD OF FABRICATING THIS DEVICE

机译:在设备关闭时已从有源基区快速移除大量载具的半导体器件及其制造方法

摘要

A semiconductor device comprising a bulk substrate and an epitaxial layer grown thereon attains the feature of rapid removal of majority carriers from an N-type active base region thereof, a function conventionally performed by anode shorts, through the incorporation into the otherwise P-type substrate of a highly doped, N-type region having a surface in contact with the N-type epitaxial layer for injecting majority carriers from an N-type active base region in the epitaxial layer into the remaining P-type portion of the substrate.
机译:包括块状衬底和在其上生长的外延层的半导体器件具有从其N型有源基极区域中快速去除多数载流子的特征,该功能通常通过结合到否则为P型的衬底中而由阳极短路来实现。图1是高掺杂的N型区域的示意图,其表面与N型外延层接触,用于将大部分载流子从外延层中的N型有源基极区注入到衬底的其余P型部分中。

著录项

  • 公开/公告号DE3278185D1

    专利类型

  • 公开/公告日1988-04-07

    原文格式PDF

  • 申请/专利权人 GENERAL ELECTRIC COMPANY;

    申请/专利号DE19823278185T

  • 发明设计人 BALIGA BANTVAL JAYANT;

    申请日1982-09-24

  • 分类号H01L29/743;H01L29/10;H01L29/08;

  • 国家 DE

  • 入库时间 2022-08-22 06:52:44

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