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SILICON DIAPHRAGM TYPE PRESSURE SENSOR

机译:硅膜片式压力传感器

摘要

PURPOSE:To improve linearity and temp. characteristic, by providing a thin- walled strain inducing part in a part of a measuring diaphragm consisting of single crystal silicon, and forming an oxidized film on the surface of the diaphragm so as to cover only the gate resistance formed in the strain inducing part. CONSTITUTION:A measuring diaphragm 10 consisting of (n) type single crystal silicon has a central rigid body 12, and a fixing part 14, and forms a thin-walled strain inducing part 16. The body 12 is formed in smaller wall thickness than the part 14, and a clearance is formed between the same and a fixing base 18 consisting of borosilicate glass. Plural pieces of (p) type gage resistors 20 are formed in the part 16. Two resistors 20 are formed in the position near the part 14 and the two resistors near the body 12. The resistors are combined in a bridge and an output is drawn out differentially thereform. An oxidized film 22 of silicon dioxide is formed on the top surface of the diaphragm 10 so as to cover only the resistors 20 after the resistors 20 are formed. The output from the resistors 20 is drawn out with electrodes 24 formed on the top surface of the film 22. The sensor having excellent linearity and temp. characteristic is thus made.
机译:目的:提高线性度和温度。通过在由单晶硅组成的测量膜片的一部分中提供薄壁应变感应部分,并在膜片的表面上形成氧化膜,从而仅覆盖在应变感应部分中形成的栅极电阻,来形成该特性。组成:由(n)型单晶硅组成的测量膜片10具有中心刚体12和固定部分14,并形成薄壁应变诱发部分16。主体12的壁厚小于零件14,并在其与由硼硅酸盐玻璃组成的固定基座18之间形成一间隙。在部件16中形成多个(p)型量规电阻器20。在部件14附近的位置处形成两个电阻器20,在主体12附近的位置处形成两个电阻器。电阻器被组合在桥中并输出输出。差异地表现出来。在膜片10的顶表面上形成二氧化硅的氧化膜22,以便在形成电阻器20之后仅覆盖电阻器20。来自电阻器20的输出通过在膜22的顶表面上形成的电极24引出。具有优异的线性和温度的传感器。这样就形成了特征。

著录项

  • 公开/公告号JPH0138255B2

    专利类型

  • 公开/公告日1989-08-11

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19820103875

  • 申请日1982-06-18

  • 分类号G01L9/04;G01L9/00;H01L29/84;

  • 国家 JP

  • 入库时间 2022-08-22 06:42:03

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