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HIGH DOSE ION IMPLANTATION DEVICE

机译:大剂量离子注入装置

摘要

PURPOSE:To improve the running time of a device by extending the cleaning period associated with the contamination of an arc chamber by heating a heater housed in the inner wall surface of the arc chamber. CONSTITUTION:A heater 15 for heating the inner wall of the arc chamber 3 is provided in the wall of the inner chamber 3. Heating the inner wall of the arc chamber 3 by the energization of the heater 15, ions and ion sources which have not been made into an ion beam can be discharged outside without being made to adhere to the arc chamber 3. Ions and ion sources which have adhered to the arc chamber on the other hand are not solidified but discharged in a gaseous condition by the heating of the inner wall of the arc chamber. This eliminates the lowering of the running time due to frequent cleanings necessitated by the contamination of the inner wall of the arc chamber 3, extends the cleaning period, and improves the running time.
机译:目的:通过加热容纳在电弧室内壁表面的加热器,延长与电弧室污染相关的清洁时间,从而延长设备的运行时间。构成:用于加热电弧室3的内壁的加热器15设置在内室3的壁中。通过加热加热器15来加热电弧室3的内壁,而没有加热的离子和离子源被制成离子束的离子可以在不粘附到电弧室3的情况下排放到外部。另一方面,粘附到电弧室的离子和离子源不会固化,而是通过加热气体而以气态排放。电弧室的内壁。这消除了由于电弧室3的内壁的污染而需要进行频繁清洁而导致的运行时间的减少,延长了清洁时间,并改善了运行时间。

著录项

  • 公开/公告号JPH0195455A

    专利类型

  • 公开/公告日1989-04-13

    原文格式PDF

  • 申请/专利权人 OKI ELECTRIC IND CO LTD;

    申请/专利号JP19870251608

  • 发明设计人 IWAMURA SHIRO;

    申请日1987-10-07

  • 分类号H01J27/08;H01J37/08;H01J37/317;

  • 国家 JP

  • 入库时间 2022-08-22 06:41:18

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