PURPOSE:To measure the shape variation of a resist pattern by irradiating the resist pattern formed on a substrate with a coherent light, diffracting the coherent light by the resist pattern and measuring the intensity of its diffracted light except zero-order. CONSTITUTION:A first sample 5A is placed on a supporting body 6, and its alignment is executed. Subsequently, by operating a laser beam source 1, a prescribed part of the first sample 5A on the supporting body 6 is irradiated with a laser beam through a half mirror 3. As a result, the laser beam is reflected on the resist surface of the prescribed part of the first sample 5A, and also, causes a diffraction. This reflected diffracted light returns to the half mirror 3 again, and this time, it is reflected by the reverse side of the half mirror 3, and this reflected light is converged by a lens 11 and forms a diffracted image on a photodetector 12. By shielding the diffracted light of the zero-order of the diffracted image by a light shielding mask 13 and measuring the intensity of the diffracted light except zero-order, the shape variation of a resist pattern is measured quantitatively.
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