deposition of a vanadium base for magnetic films.

摘要

A sputtered vanadium underlayer is provided under Co-Ni films used for magnetic recording; for "high Hc" and "good squareness", a V thickness of about 1000 A DEG or more is preferred with 500 A DEG - 5000 A DEG Co-20 Ni; the sputtering being preferably at "moderate" rate, with RF diode or DC magnetron equipment, onto a "moderately-cool", high-flatness substrate, using argon or the like at moderate pressure.