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High purity titanium used as cathodic sputtering target - in molten salt electrolytic cell, with parts contacting electrolyte made of nickel to avoid titanium contamination

机译:高纯度钛用作阴极溅射靶-在熔融盐电解槽中,部件与镍制成的电解质接触以避免钛污染

摘要

High purity Ti is produced by feeding the Ti raw material into a molten salt electrolysing appts in which the parts which contact salt melt are made of high purity.N. USE/ADVANTAGE - Making high purity Ti used as target material in cathodic sputter coating. Ni does not lead to impuritiess in the Ti ppte contg max 0.1 ppm alkali metal, max 1 ppb radioactive elements and max 100 ppm oxygen.
机译:通过将Ti原料送入熔融盐电解装置中来生产高纯度Ti,在熔融盐电解装置中,与盐熔体接触的部分均具有高纯度N。使用/优点-制备高纯度的钛作为阴极溅射镀膜的靶材。 Ni不会在Ti ppte中杂质(最大0.1 ppm的碱金属,最大1 ppb的放射性元素和最大100 ppm的氧气)中不包含杂质。

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