首页> 外国专利> Gallium alkyl cpds. prodn. - by reaction of gallium halide cpds. with alkyl-aluminium halide(s) in presence of metal halide(s) as auxiliary bases

Gallium alkyl cpds. prodn. - by reaction of gallium halide cpds. with alkyl-aluminium halide(s) in presence of metal halide(s) as auxiliary bases

机译:烷基镓的cpds。产品-通过卤化镓cpds的反应。在金属卤化物作为辅助碱的情况下用烷基卤化铝

摘要

Gallium alkyls (I) are produced by reaction of Ga halogen cpds. (II) with alkylaluminium halides (III) in the presence of metal halides (IV) as auxiliary bases. (II) are Ga trihalides, alkylgallium dihalides or dialkylgallium halides, pref. coresp. chlorides; (III) are dialkyaluminium halides, alkylaluminium dihalides or mixts. thereof or "sesquihalides" (R3Al2X3), pref. corresp. chlorides, pref. obtd. in situ by addn. of Al halide to trialkylaluminium; (IV) are Gp. I-III metal halides, pref. chlorides, esp. NaCl and/or KCl; reaction temp. is 70-450 deg.C; reaction is carried out in the liquidus region of the educt mixt. up to the temp. at which marked decomposition of educts and/or prods. begins. USE/ADVANTAGE - (I) are useful for the prodn. of III/V semiconductors, esp. Ga/As and Ga/P, by CVD processes, partic. using the volatile lower alkyls. The process enables the prodn. of (I) in higher yield and purity (w.r.t. prior art processes), from cheap and readily available precursors.
机译:烷基镓(I)是通过Ga卤素cpds反应制得的。 (II)与烷基卤化铝(III)在金属卤化物(IV)存在下作为辅助碱。 (II)是优选的三卤化镓,二卤化烷基镓或二卤化二烷基镓。 coresp。氯化物; (III)是二烷基卤化铝,烷基二卤化铝或混合物。其或“倍半卤化物”(R3Al2X3),优选。对应氯化物t。由addn原位执行。卤化铝为三烷基铝; (IV)是Gp。 I-III金属卤化物,优选。氯化物,特别是氯化钠和/或氯化钾;反应温度是70-450摄氏度;反应在离析物混合物的液相线区域中进行。取决于温度。显着分解离析物和/或产物。开始。使用/优势-(I)对产品有用。 III / V半导体的制造,特别是Ga / As和Ga / P,通过CVD工艺进行。使用挥发性的低级烷基。该过程启用产品。 (I)以便宜和容易获得的前体,以较高的收率和纯度(w.r.t.现有技术方法)制备。

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