High resolution positive working photoresists - comprising polymer contg. carboxylic acid anhydride or phenolic hydroxyl gps. and substd. 1,4-di:hydro:pyridine cpd. as photoactive agent

摘要

A light sensitive mixt. of (i) a polymer contg. carboxylic acid anhydride gps. or phenolic OH gps. and (ii) a photoactive component consisting of a 1,4-dihydropyridine or 1,4-dihydropyridine deriv. of formula (I) in which the gps. R1 (same or different) = H, (CH2)n-CH3, OH, (CF2)n-CF3, C6H5, COOH, COO-(CH2)n-CH3, CO-(CH2)n-CH3, (CH2)n-OH, (CH=CH)p-CO-CH3, F, Cl, Br or I, m = 0-10, n = 0-10 and p = 1-4, or one of the two pairs of gps. R1 in the ortho position w.r.t. each other may be an aromatic or olefinically unsaturated 6-ring, and R = a gp. of formula (II), (III), (IV) and (V), in which the NO2 gp. is in the ortho-position w.r.t. the bond to the dihydropyridine ring and the residues R2 (same or different) = H, (CH2)n-CH3, (CF2)n-CF3, C6H5, O-C6H5, COOH, COO-(CH2)n-CH3, (CH2)n-O-(CH2)m-CH3, F, Cl, Br or I, m = 0-10 and n = 0-10. USE/ADVANTAGE - The compsns. are positive working photoresists useful for the photolithographic prodn. of relief structures with high resolution, e.g. to below 1 micrometre. The photoactive agents (I) are easy and economical to synthesise, are non-toxic, have good solubility characteristics and high thermal stability. The photoresist compsn. have good storage stability and can be developed in aq. alkaline developers. Relatively thick layers (e.g. greater than 30 micrometres) of the photoresist can be structured to give high resolution relief structures.