首页>
外国专利>
MALEIMIDO CONTAINING NEGATIVE PROCESSING TYPE DEEP UV PHOTORESIST
MALEIMIDO CONTAINING NEGATIVE PROCESSING TYPE DEEP UV PHOTORESIST
展开▼
机译:含有负加工型深紫外光致抗蚀剂的马里米多
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: To enable exposure with light of short wavelength and to reproduce a fine image by using a compsn. contg. a resin which is an imide copolymer capable of crosslinking when exposed and heat-treated in combination with a sensitizer. CONSTITUTION: A compsn. contg. a crosslinkable resin represented by formula I and soluble in an aq. alkali soln. and a photosensitive compd. generating an enough strong acid when exposed with radiation energy is used. The resin in the compsn. is enough to form a practical mixture of the components of the compsn. and the strong acid crosslinks the resin and makes it insoluble in the aq. alkali soln. by heating at a sufficiently high temp. for a sufficiently long time. In the formula I, each of R1 -R10 is 1-5C alkyl, X is H, etc., (a) is 1-3, (b) is 0-3, (c) is 1-3 and (n) is a number giving a mol.wt. of about 1,000-800,000 to the resin. Exposure with light of short wavelength is enabled and a fine image is reproduced.
展开▼