IMPROVEMENT OF BUILT-UP FILM FORMING DEVICE BY MICROWAVE CVD METHOD

摘要

PURPOSE:To obtain a functional built-up film in a range over a large area in a uniform state by forming an auxiliary base body of material wherein the surface has insulating properties and the product of relative dielectric constant and dielectric loss tangent is specified value or below and providing this auxiliary base body to one end of a base body and forming the film. CONSTITUTION:The auxiliary base bodies 113, 114 are formed of material having electrically insulating properties wherein the product of relative dielectric constant and dielectric loss tangent in the frequency of the utilized microwave is 2X10-2 or below. The auxiliary bodies 113, 114 are provided so as to be mutually touched to a base body 105 in one end of the part of the base body 105 positioned in the vicinities of the introduction windows 102 for energy of microwave. While the electric potential of plasma is controlled by a bias electrode 112 provided in plasma, a film is formed on the surface of the base body 105. Since stability and uniformity of discharge are realized by specifying the material of the auxiliary base bodies 113, 114, the built-up film having the good characteristics is obtained in a uniform state in a range over a large area.