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DEVICE AND METHOD FOR DETECTING DEFECT WHICH IS CARRIED VERTICALLY IN INTEGRATED CIRCUIT

机译:用于垂直检测集成电路中的缺陷的装置和方法

摘要

PURPOSE: To detect any defect in an integrated circuit by forming a vertical double bridge test structure including a first test structure (lower part) and a second test structure (upper part). CONSTITUTION: A first meandering part 14 on a substrate 10 is constructed as a high electric resistance having a predetermined number of intermediate segments 16, and each strip end of a highly conductive first set strips 32 insulated from the first meandering part 14 and separated in a non-overlapping relation is connected with an intermediate segment 16 end corresponding to the first meandering part 14 to form a first test structure 48. A second meandering part 24 is constructed as a high electric resistance having a predetermined number of intermediate segments 26, and each strip of a highly conductive second set strip 62 insulated from the second meandering part 24 is matched with each one corresponding to the intermediate segments 26 of the second meandering part 24 in an overlapping relation and each end is electrically joined with the intermediate segment 26 end corresponding to the first meandering part 14 to construct a second test structure. 76. Hereby, any defect in a semiconductor circuit is detected, and yield prediction and estimated efficiency are improved.
机译:目的:通过形成包括第一测试结构(下部)和第二测试结构(上部)的垂直双桥测试结构来检测集成电路中的任何缺陷。构成:基板10上的第一曲折部分14被构造为具有预定数量的中间段16的高电阻,并且高导电性的第一组条带32的每个条带端部与第一曲折部分14绝缘并且被分开。非重叠关系与对应于第一曲折部分14的中间段16端连接以形成第一测试结构48。第二曲折部分24被构造为具有预定数量的中间段26的高电阻,并且每个与第二曲折部分24绝缘的高导电性第二组条62的条带以重叠的关系与对应于第二曲折部分24的中间段26的每个匹配,并且每个端部与对应的中间段26电连接。到第一弯曲部分14,以构造第二测试结构。 76.由此,可以检测出半导体电路中的任何缺陷,并且可以提高成品率预测和估计效率。

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