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A PROCESS FOR MANUFACTURING A SELECTIVELY INTERMIXED MULTILAYERED SEMICONDUCTOR PRODUCT BY SELECTIVE INTERMIXING OF A MULTILAYERED SEMICONDUCTOR STRUCTURE
A PROCESS FOR MANUFACTURING A SELECTIVELY INTERMIXED MULTILAYERED SEMICONDUCTOR PRODUCT BY SELECTIVE INTERMIXING OF A MULTILAYERED SEMICONDUCTOR STRUCTURE
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机译:通过选择性地混合多层半导体结构来制造选择性地混合多层半导体产品的方法
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摘要
A multilayer semiconductor structure, formed of two or more separate layers of different materials can be selectively intermixed so as to become compositionally modified, such that the distinction between the different original materials is lost, at least partially. This intermixing process employs irradiation with a pulsed or rapidly scanned laser or electron beam, generally at ambient conditions of temperature and pressure, at energy levels which avoid physical damage to the layered structure. The intermixing may be more complete when multiple pulses from the laser or electron beam are employed.
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