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Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records

机译:辐射敏感组合物,用其生产的辐射敏感记录材料以及浮雕记录的生产方法

摘要

The invention relates to a normally positive-working radiation-sensitive composition which contains, as essential constituents, a water-insoluble binder which is soluble in aqueous alkaline solutions, a 1,2-quinone diazide and a compound which reduces the developer solubility of the exposed regions by thermal treatment. In this composition at least one urethane of the general formula I is present as the compound which reduces the developer solubility: IMAGE where R1 is hydrogen or methyl, R2 is hydrogen, alkyl, optionally substituted aryl or an optionally substituted arylaminocarbonyl, R3 is an optionally substituted arylene or arylene-alkylene, Q is hydrogen, -CH4-p, CR5R6, where R5 and R6 may be identical or different and are hydrogen, alkyl or aryl, carbonyl, an oxygen or sulphur atom or sulphonyl, m is 1, 2 or 3, and n is a number /= 1 and /= 50, and p is 1, 2 or 3. The composition is suitable for producing radiation-sensitive recording material which has good storage life accompanied by high radiation sensitivity and exhibits a wide image reversal tolerance in a process for producing relief images.
机译:本发明涉及一种通常为正型的放射线敏感性组合物,该组合物含有可溶于碱性水溶液的水不溶性粘合剂,1,2-醌二叠氮化物和降低其显影剂溶解性的化合物作为基本成分。通过热处理暴露区域。在该组合物中,存在至少一种通式I的氨基甲酸酯作为降低显影剂溶解度的化合物:其中R1为氢或甲基,R2为氢,烷基,任选取代的芳基或任选取代的芳基氨基羰基,R3为任选取代的亚芳基或亚芳基亚烷基,Q为氢,-CH 4 -p,CR 5 R 6,其中R 5和R 6可以相同或不同,并且为氢,烷基或芳基,羰基,氧或硫原子或磺酰基,m为1 ,2或3,并且n是> / = 1且

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