首页> 外国专利> Producing microstructure in material - by placing material on magnetically held holder opposite an electrode in vacuum, admitting reactive gas and exposing material to plasma

Producing microstructure in material - by placing material on magnetically held holder opposite an electrode in vacuum, admitting reactive gas and exposing material to plasma

机译:在材料中产生微观结构-通过将材料放在真空中与电极相对的磁性保持架上,吸收反应气体并使材料暴露于等离子体中

摘要

Products with microstructures are produced by placing the sample of material in a holder in a vacuum chamber and exhausting the chamber down to a specific pressure level, admitting a reactive gas to the chamber and applying a magnetic field to the sample holder or to an electrode located opposite the sample. This arrangement allows the holder or the electrode to move and to maintain a set gap between the holder and electrode; a plasma is then produced in the reactive gas by the holder and electrode, so forming the microstructure in the sample. A preferred material for the microstructure is a novolak resin or polyimide. ADVANTAGE - The method produces no dust. The gap between electrodes can be changed without contact, so as to suit a wide variety of materials and to use different methods.
机译:具有微结构的产品是通过将材料样品放入真空室的支架中并将其排气至特定压力水平,将反应性气体引入室并将磁场施加到样品支架或电极上来生产的在样品对面。这种布置允许支架或电极移动并在支架和电极之间保持一定的间隙。然后通过支架和电极在反应气体中产生等离子体,从而在样品中形成微观结构。用于微结构的优选材料是酚醛清漆树脂或聚酰亚胺。优点-该方法不产生粉尘。电极之间的间隙可以不接触而改变,从而适合多种材料并使用不同的方法。

著录项

  • 公开/公告号DE4132730A1

    专利类型

  • 公开/公告日1992-04-09

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI K.K. TOKIO/TOKYO JP;

    申请/专利号DE19914132730

  • 发明设计人 YONEDA MASAHIRO ITAMI HYOGO JP;

    申请日1991-10-01

  • 分类号C23F4/00;C03C15/00;C04B35/00;C30B33/00;C04B35/50;H01J37/32;C30B35/00;G11B5/84;

  • 国家 DE

  • 入库时间 2022-08-22 05:25:29

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