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Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

机译:有机和无机材料对激光产生的等离子体产生的强烈EUV辐射的响应

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We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10-300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.
机译:我们已经研究了聚合物对超过烧蚀阈值和微加工的激光产生等离子体产生的EUV辐射的响应。我们专注于制造PDMS,PMMA,丙烯酸嵌段共聚物(BCP)和二氧化硅的精确3D微观结构。微加工技术可以应用于三维微流控和生物医学设备。 EUV处理有望实现一种实用的微加工技术。在当前的工作中,我们使用了两个EUV辐射源。 (a)通过以500 mJ /脉冲的Nd:YAG激光照射Ta靶,产生10-300 eV范围内的宽带EUV光。 (b)用脉冲TEA CO2激光分别照射固体Xe和Sn靶标,产生11和13 nm的窄带EUV光。使用椭圆镜,将产生的EUV光以超过消融阈值的高功率密度聚光到材料上。我们发现,可以在厚度为4-10微米的PMMA和PDMS片中分别制造250和230 nm / shot的直径为1微米的通孔。 PMMA片的有效烧蚀可应用于类似LIGA的工艺,以制造用于微模具和纳米模具的金属的微结构。如果用超过独特阈值功率密度的EUV光辐照,PDMS片材将被烧蚀,而PDMS表面则以更低的功率密度进行了改性。此外,将BCP片材烧蚀为具有1微米的结构。因此,我们开发了一种实用技术,用于以微米为单位对PMMA,PDMS和BCP板进行微加工。

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