Method for forming film of uniform thickness on semiconductor substrate having concave portion

摘要

A photoresist of sufficient thickness to fill a scribe line is applied on an entire substrate. Then, the photoresist is exposed through a photomask having a pattern corresponding to the scribe line and is thereafter developed. A photosensitized gelatin is applied by spin- coating on the flat substrate obtained in this process, patterned, and then dyed, to obtain a color filter array.