首页> 外国专利> POSITIVE-TYPE PHOTO-SENSITIVE ANIONIC ELECTRODEPOSITION PAINT RESIN COMPOSITION, ELECTRODEPOSITION COATING BATH USING THE COMPOSITION, ELECTRODEPOSITION COATING METHOD AND PRODUCTION OF PRINTED CIRCUIT BOARD

POSITIVE-TYPE PHOTO-SENSITIVE ANIONIC ELECTRODEPOSITION PAINT RESIN COMPOSITION, ELECTRODEPOSITION COATING BATH USING THE COMPOSITION, ELECTRODEPOSITION COATING METHOD AND PRODUCTION OF PRINTED CIRCUIT BOARD

机译:正型光敏阴离子电沉积涂料树脂组合物,使用该组合物的电沉积涂浴,电沉积涂膜方法和印刷电路板的生产

摘要

PURPOSE: To provide the subject composition having excellent sensitivity, resolution and electrodeposition bath stability and containing a copolymer composed of (meth)acrylic acid and tetrahydropyranyl methacrylate, etc., and a compound capable of forming an acid by the irradiation of actinic light. ;CONSTITUTION: The objective composition contains (A) a copolymer produced by copolymerizing (i) (meth)acrylic acid, (ii) tetrahydropyranyl (meth)acrylate and (iii) a polymerizable monomer giving a homopolymer having a glass transition temperature of ≤0°C as essential components and (B) a compound expressed by formula (R is alkyl) and capable of forming an acid by the irradiation of actinic light.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:提供具有优异的灵敏度,分辨率和电沉积浴稳定性并且包含由(甲基)丙烯酸和甲基丙烯酸四氢吡喃酯等组成的共聚物和能够通过光化光照射形成酸的化合物的主题组合物。 ;组成:目标组合物包含(A)通过共聚(i)(甲基)丙烯酸,(ii)四氢吡喃基(甲基)丙烯酸酯和(iii)可聚合单体而制得的玻璃化转变温度≤0的均聚物的共聚物(C)1993,JPO&Japio; C为基本成分,(B)为式(R为烷基)表示的化合物,能够通过光化光照射形成酸。

著录项

  • 公开/公告号JPH0517711A

    专利类型

  • 公开/公告日1993-01-26

    原文格式PDF

  • 申请/专利权人 HITACHI CHEM CO LTD;

    申请/专利号JP19910168207

  • 申请日1991-07-09

  • 分类号C09D5/44;C09D133/14;C25D13/06;G03F7/039;H05K3/06;

  • 国家 JP

  • 入库时间 2022-08-22 05:15:55

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