首页> 外国专利> POSITIVE TYPE PHOTOSENSITIVE ANIONIC ELECTRODEPOSITION COATING COMPOUND RESIN COMPOSITION, ELECTRDEPOSITION COATING BATH USING THE SAME COMPOSITION, ELECTRODEPOSITION COATING AND PRODUCTION OF PRINTED CIRCUIT BOARD

POSITIVE TYPE PHOTOSENSITIVE ANIONIC ELECTRODEPOSITION COATING COMPOUND RESIN COMPOSITION, ELECTRDEPOSITION COATING BATH USING THE SAME COMPOSITION, ELECTRODEPOSITION COATING AND PRODUCTION OF PRINTED CIRCUIT BOARD

机译:正型光敏阴离子电沉积涂料树脂组合物,使用相同组成的电沉积涂料浴,电沉积涂料和印刷电路板生产

摘要

PURPOSE:To obtain a positive type photosensitive anionic electrodeposition coating compound resin composition having high sensitivity, high resolving power and excellent water dispersion stability of electrodeposition coating bath. CONSTITUTION:A positive type photosensitive anionic electrodeposition coating compound resin composition comprising (A) an acrylic copolymer obtained by copolymerizing (a) acrylic acid and/or methacrylic acid with (b) a compound containing a group unstable to acid and (c) a polymerizable monomer to provide a homopolymer having =0 deg.C glass transition temperature as essential components and (B) a compound generating an acid by irradiation with active rays. An electrodeposition coating bath, a method for electrodeposition coating and production of printed circuit board using the same composition.
机译:用途:获得具有高灵敏度,高分辨力和优异电沉积涂料浴水分散稳定性的正型光敏阴离子电沉积涂料复合树脂组合物。组成:一种正型光敏阴离子电沉积涂料复合树脂组合物,其中包含(A)通过将(a)丙烯酸和/或甲基丙烯酸与(b)含对酸不稳定的基团的化合物和(c)可聚合的共聚物共聚而获得的丙烯酸共聚物单体以提供具有≤= 0℃的玻璃化转变温度作为基本组分的均聚物,以及(B)通过活性射线辐照产生酸的化合物。电沉积涂覆浴,电沉积涂覆的方法以及使用该组合物的印刷电路板的生产。

著录项

  • 公开/公告号JPH0539444A

    专利类型

  • 公开/公告日1993-02-19

    原文格式PDF

  • 申请/专利权人 HITACHI CHEM CO LTD;

    申请/专利号JP19910314529

  • 申请日1991-11-28

  • 分类号C09D5/44;C25D13/06;C25D13/10;G03F7/004;G03F7/029;G03F7/039;H01L21/027;H05K3/06;H05K3/18;

  • 国家 JP

  • 入库时间 2022-08-22 05:15:32

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