首页> 外国专利> A method to fabricate high quality GaAs single crystals by changing the shoulder angle of the booth during GaAs single crystal growth by vertical temperature gradient method

A method to fabricate high quality GaAs single crystals by changing the shoulder angle of the booth during GaAs single crystal growth by vertical temperature gradient method

机译:垂直温度梯度法在GaAs单晶生长过程中改变隔室的肩角来制造高质量GaAs单晶的方法

摘要

The present invention relates to a method for manufacturing a high-quality GaAs single crystal using a vertical temperature gradient reduction method, and in order to manufacture a high-quality GaAs single crystal by reducing the generation of dislocations, it is possible to improve the thermal condition by changing the shoulder angle of the boat Thereby suppressing the generation of the twin crystal of the polycrystal and flattening the solid-liquid interface.
机译:本发明涉及利用垂直温度梯度降低法制造高质量的GaAs单晶的方法,并且为了通过减少位错的产生来制造高质量的GaAs单晶,可以提高热效率。通过改变晶舟的肩角,可以抑制多晶双晶的产生并使固-液界面变平。

著录项

  • 公开/公告号KR930010243A

    专利类型

  • 公开/公告日1993-06-22

    原文格式PDF

  • 申请/专利权人 박원근;

    申请/专利号KR19910020123

  • 发明设计人 고한준;신기철;노용정;

    申请日1991-11-13

  • 分类号C30B29/42;

  • 国家 KR

  • 入库时间 2022-08-22 05:04:14

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