首页> 外国专利> A method of flattening the solid-liquid interface during GaAs single crystal growth by vertical temperature gradient method

A method of flattening the solid-liquid interface during GaAs single crystal growth by vertical temperature gradient method

机译:垂直温度梯度法平整GaAs单晶生长过程中固液界面的方法

摘要

The present invention relates to a method for improving the solid-liquid interface shape by controlling the growth parameters and the influence of the growth parameters on the solid-liquid interface shape during the growth of the GaAs single crystal by the vertical temperature gradient reduction method, GaAs single crystal growth by vertical temperature gradient reduction is selected by selecting at least one of increasing the axial temperature gradient, decreasing the temperature gradient in the high temperature region, increasing the cone angle of the boat, or increasing the growth rate. And the solid-liquid interface is flattened.
机译:本发明涉及通过垂直温度梯度降低法控制GaAs单晶生长过程中的生长参数和生长参数对固液界面形状的影响来改善固液界面形状的方法,通过选择增加轴向温度梯度,降低高温区域中的温度梯度,增加舟皿的锥角或增加生长速率中的至少一项来选择通过垂直温度梯度降低来生长GaAs单晶。固液界面变平。

著录项

  • 公开/公告号KR930013224A

    专利类型

  • 公开/公告日1993-07-21

    原文格式PDF

  • 申请/专利权人 박원근;

    申请/专利号KR19910025913

  • 发明设计人 고한준;신기철;노용정;

    申请日1991-12-31

  • 分类号C30B29/42;

  • 国家 KR

  • 入库时间 2022-08-22 05:04:11

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号