Local copper@ deposition from organo:metallic film on substrate - by forming film from mixt. of copper acetate and copper formate in specified ratio and depositing film by laser irradiation

摘要

For local Cu deposition from an organo-metallic film on a substrate, the film is formed from a mixt. of Cu acetate and Cu formate in a ratio of 1:5 acetate:formate. The mixt. forms an amorphous film. Deposition is caused by laser beam irradiation. USE/ADVANTAGE - Used partic. for forming conductor tracks on printed circuit boards to electronic units. Film is easily applied, retains amorphous state over long periods.