PROCESS FOR PRODUCING A SILICON NITRIDE ARTICLE COATED WITH A DIAMOND FILM OR SIMILAR MATERIAL

摘要

The invention relates to a process for coating a substrate formed of a silicon nitride material with a diamond film or the like by gas phase synthesis. BR/ This method comprises a first step of applying said film in a thickness of 0.5 to 2.0 mum at a temperature no higher than that at which the constituents of the intergranular boundary of the substrate volatilize, and a second step of synthesizing said film to a thickness of 5 to 100 mum at a temperature that activates the synthesis of said film. BR/ Application: production of a long-life article for cutting tools and optical or electronic materials, with greater resistance to wear and corrosion.