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Photoresist composition containing block copolymer resin and positive- working o-quinone diazide or negative-working azide sensitizer compound
Photoresist composition containing block copolymer resin and positive- working o-quinone diazide or negative-working azide sensitizer compound
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机译:包含嵌段共聚物树脂和正型邻醌二叠氮化物或负型叠氮化物敏化剂化合物的光致抗蚀剂组合物
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摘要
A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolymer with a second reactive phenol in the presence of an aldehyde to form substantially block copolymers. The use of these resins in photoresist formulations leads to improved thermal properties, etch resistance and photospeed.
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