首页> 外国专利> ANTISTATIC AND ANTIREFLECTING FILM AND COATING FOR FORMING THEREOF

ANTISTATIC AND ANTIREFLECTING FILM AND COATING FOR FORMING THEREOF

机译:抗静电和反光膜及其涂层

摘要

PURPOSE: To obtain a coating for forming an antistatic and antireflecting film capable of forming an antistatic film, having high refractive index and excellent in adhesion to an antireflecting film and an antistatic and antireflecting film prepared therefrom. ;CONSTITUTION: This coating for forming an antistatic and antireflecting film is obtained by replacing a part of a silicon alkoxide hydrolyzate with a zirconium alkoxide or a titanium alkoxide in a coating prepared by dispersing ultrafine particles having 1-100nm average particle diameter and ≥1.6 refractive index and the silicon alkoxide hydrolyzate in a solvent. Furthermore, the antistatic and antireflecting film is composed of an antistatic film obtained from this coating for forming the antistatic and antireflecting film and the coating prepared by dispersing the silicon alkoxide hydrolyzate therein.;COPYRIGHT: (C)1994,JPO&Japio
机译:用途:获得一种用于形成抗静电和抗反射膜的涂料,该涂料能够形成抗静电膜,该涂料具有高折射率并且与抗反射膜和由其制备的抗静电和抗反射膜的粘合性优异。 ;组成:用于形成抗静电和抗反射膜的涂层是通过在分散有平均粒径为1-100nm且≥1.6屈光度的超细颗粒制备的涂层中用烷氧基锆或烷氧基钛代替部分烷氧基硅水解产物得到的。指数和烷氧基硅在溶剂中的水解产物。此外,该抗静电和抗反射膜由从用于形成抗静电和抗反射膜的该涂层获得的抗静电膜和通过将烷氧基硅水解产物分散在其中而制备的涂层组成。COPYRIGHT:(C)1994,JPO&Japio

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