首页> 外国专利> MULTILAYER FILM MIRROR FOR X-RAY, REFLECTIVE X-RAY MASK AND FABRICATION THEREOF

MULTILAYER FILM MIRROR FOR X-RAY, REFLECTIVE X-RAY MASK AND FABRICATION THEREOF

机译:用于X射线,反射X射线面膜及其制造的多层膜镜

摘要

PURPOSE: To increase freedom in relative positional relationship between a reflective mask and an optical focusing system. ;CONSTITUTION: A substance for which difference of refractive index of light having wavelength in X-ray region and refractive index in the vacuum is low and a substance having high difference of refractive index are laminated alternately on a substrate 2 to form a multilayer film mirror for X-ray. In such a multilayer film mirror, surface 3 of the multilayer film 1 is formed while inclining by a predetermined angle ϕ against the interfaces of respective layers constituting the multilayer film 1.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:增加反射罩和光学聚焦系统之间相对位置关系的自由度。 ;组成:将在X射线区域具有波长的光的折射率与真空中的折射率的折射率之差低的物质和具有高折射率差的物质交替地层压在基板2上,以形成多层膜镜X光片在这种多层膜镜中,多层膜1的表面3形成为倾斜预定角度φ。构成多层膜1的各层的界面。版权所有:(C)1994,JPO&Japio

著录项

  • 公开/公告号JPH06180399A

    专利类型

  • 公开/公告日1994-06-28

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP19920334735

  • 发明设计人 MURAKAMI KATSUHIKO;OSHINO TETSUYA;

    申请日1992-12-15

  • 分类号G21K1/06;

  • 国家 JP

  • 入库时间 2022-08-22 04:49:16

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