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APPARATUS AND METHOD FOR TOTAL-REFLECTION X-RAY FLUORESCENCE ANALYSIS

机译:全反射X射线荧光分析的装置和方法

摘要

PURPOSE: To obtain a total-reflection X-ray fluorescence analyzing method and apparatus which can perform the highly accurate analysis without using an X-ray source of high luminance by increasing the value of the solid angle from the X-ray source. ;CONSTITUTION: A sample stage 1 comprises an insulating material such as alumina (Al2O3). The surface of the stage is finished as the state of a mirror surface. The surface shape of the sample stage 1 forms a part of, e.g. a cylindrical surface. A spectroscopic crystal 54 is curved so as to protrude along the curving direction. Since a sample 50 is adsorbed with the sample stage 1, whose surface is curved in this way, the surface 51 of the sample is also curved. Therefore, the difference of an incident angle α of incident diffracted X rays B2 becomes small to each other.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:获得一种全反射X射线荧光分析方法和设备,该方法和设备可以通过增加来自X射线源的立体角的值而无需使用高亮度的X射线源来执行高精度分析。 ;组成:样品台1包含绝缘材料,例如氧化铝(Al 2 O 3 )。载物台的表面以镜面状态完成。样品台1的表面形状形成例如一部分。圆柱表面。光谱晶体54是弯曲的,以便沿着弯曲方向突出。由于样品50被样品台1吸附,该样品台的表面以这种方式弯曲,因此样品的表面51也弯曲。因此,入射衍射X射线B2的入射角α之差彼此变小。版权所有:(C)1994,日本特许厅

著录项

  • 公开/公告号JPH0650916A

    专利类型

  • 公开/公告日1994-02-25

    原文格式PDF

  • 申请/专利权人 RIGAKU DENKI KOGYO KK;

    申请/专利号JP19920227884

  • 发明设计人 SAKO YUKIO;

    申请日1992-08-03

  • 分类号G01N23/223;

  • 国家 JP

  • 入库时间 2022-08-22 04:49:01

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