首页> 外国专利> METHOD AND APPARATUS FOR REMOVING RESIDUAL OF CHLORINATED SOLVENT FORMED DURING DRYING STAGE FROM CONTACT WATER IN DRY CLEANING MACHINE OF CLOTHES

METHOD AND APPARATUS FOR REMOVING RESIDUAL OF CHLORINATED SOLVENT FORMED DURING DRYING STAGE FROM CONTACT WATER IN DRY CLEANING MACHINE OF CLOTHES

机译:在干衣清洗机中从接触水中除去干燥阶段形成的氯化溶剂残留的方法和装置

摘要

PURPOSE: To provide a method and an apparatus for removing from contact water of residual of a chlorinated solvent resulting from the drying stage in a dry cleaning machine of clothes and solving an environmental problem caused by the abandonment of the contact water. ;CONSTITUTION: The contact water containing chlorinated solvent residual after decantation is evaporated, the vapor is irradiated with ultraviolet radiation, the chlorine-carbon bond of the solvent is destroyed and it is turned to a state harmless to environmental pollution and discharged into the atmosphere. This device for that is provided with an evaporation chamber 7, a means 9 for evaporating the contact water and the solvent residual and an ultraviolet ray lamp 12 arranged inside a housing 11 on the outside of a chamber communicated with the evaporation chamber through a window 10 closed by a quartz glass plate.;COPYRIGHT: (C)1993,JPO
机译:目的:提供一种方法和设备,用于从衣物的干洗机中的干燥阶段中除去残留的氯化溶剂,并解决由废弃接触水引起的环境问题。组成:倾析后含有氯化溶剂残留的接触水蒸发,蒸气被紫外线辐射,溶剂的氯碳键被破坏,变成对环境无害的状态并排放到大气中。为此,该装置设置有蒸发室7,用于蒸发接触水和溶剂残留物的装置9,以及布置在壳体11内的在壳体外部的紫外线灯12,壳体11的外部通过窗口10与蒸发室连通。 ;由石英玻璃板封闭。;版权所有:(C)1993,日本特许厅

著录项

  • 公开/公告号JPH05317579A

    专利类型

  • 公开/公告日1993-12-03

    原文格式PDF

  • 申请/专利权人 RENZACCI SPA IND LAVATRICI;

    申请/专利号JP19920279061

  • 发明设计人 RENZACCI GABRIO;

    申请日1992-10-19

  • 分类号D06F43/08;B01D1/00;C02F1/32;C02F1/58;

  • 国家 JP

  • 入库时间 2022-08-22 04:47:34

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