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Method of monitoring major constituents in plating baths containing codepositing constituents

机译:监测含有共沉积成分的电镀液中主要成分的方法

摘要

A method of monitoring the concentration of metal ions comprising a major constituent in a plating bath which is insensitive to the effects of other codepositing constituents within the bath. The method involves applying a brief plating signal to a pretreated electrode positioned within the plating bath solution, applying a stripping signal to the plated electrode, and monitoring the resultant stripping signal response current. Certain characteristics of the stripping signal response current accurately indicate major constituent concentration levels and are unaffected by the codepositing constituents. The method complements and is easily integrated with known voltammetric techniques for analysis of trace constituents, thus forming an integral part of an efficient overall plating bath analysis system. By adjusting major constituent concentration levels in accordance with measurements made using the method of the present invention, a high quality plating bath can be easily and inexpensively maintained.
机译:一种监测包括在电镀液中的主要成分的金属离子的浓度的方法,该金属离子对镀液中其他共沉积成分的影响不敏感。该方法包括向放置在镀浴溶液内的预处理电极施加短暂的镀覆信号,向镀覆的电极施加剥离信号,以及监测所得的剥离信号响应电流。剥离信号响应电流的某些特性可准确指示主要成分浓度水平,并且不受共沉积成分的影响。该方法是用于分析痕量成分的已知伏安技术的补充,并易于与之集成,因此构成了有效的整体电镀浴分析系统的组成部分。通过根据使用本发明的方法进行的测量来调节主要成分浓度水平,可以容易且廉价地维持高质量的镀浴。

著录项

  • 公开/公告号EP0597475A1

    专利类型

  • 公开/公告日1994-05-18

    原文格式PDF

  • 申请/专利权人 HUGHES AIRCRAFT COMPANY;

    申请/专利号EP19930118296

  • 发明设计人 LUDWIG FRANK A.;

    申请日1993-11-11

  • 分类号G01N27/42;

  • 国家 EP

  • 入库时间 2022-08-22 04:38:59

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