首页> 外国专利> Positive working, radiation-sensitive mixture based on acid-splittable and photochemically acid-forming compounds and processes for the production of relief patterns and relief images.

Positive working, radiation-sensitive mixture based on acid-splittable and photochemically acid-forming compounds and processes for the production of relief patterns and relief images.

机译:基于酸可分裂和光化学成酸化合物的正性,对辐射敏感的混合物,以及产生浮雕图案和浮雕图像的方法。

摘要

The invention relates to a positive radiation-sensitive composition and a process for obtaining relief images. …??The radiation-sensitive composition contains… a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions, and… b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable grouping and, in addition, a further grouping which produces a strong acid when exposed to radiation, the polymeric binder (a) consisting of a mixture of a phenolic polymer and a resin of the novolak type. …??The mixture according to the invention is suitable, in particular, for producing photoresists.
机译:本发明涉及对正辐射敏感的组合物和获得浮雕图像的方法。 ………辐射敏感性组合物包含…a)在碱水溶液中可溶或至少可分散的水不溶性聚合物粘合剂,和…b)通过暴露增加在碱水溶液中的溶解度的有机化合物。丙烯酸,含有至少一个可酸裂解的基团,另外还有在辐射下会产生强酸的另一基团,聚合物粘合剂(a)由酚醛聚合物和线型酚醛清漆树脂的混合物组成类型。 ……,根据本发明的混合物特别适合于生产光致抗蚀剂。

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