首页> 外国专利> Device with charge carrier injection for use in eg. light emitting laser sources - into wide band gap material via increasing band gap material

Device with charge carrier injection for use in eg. light emitting laser sources - into wide band gap material via increasing band gap material

机译:具有电荷载流子注入的装置,例如用于发光激光源-通过增加带隙材料进入宽带隙材料

摘要

A device is claimed having an arrangement for charge carrier injection into large bandgap materials which are difficult to make conductive by doping comprising (a) a material with a constant or partially increasing narrow bandgap E1, forming a free charge carrier (electron or hole) source; (b) a material with a wide gap R3; (c) an undoped material with a bandgap insuedo-continuous increasing from E1 to E3; and (d) an arrangement for applying a voltage to cause charge carrier circulation from the narrow bandgap (E1) material towards the wide bandgap (E3) material via the increasing bandgap material. Also claimed are (i) a visible light-emitting laser source utilising the above device; (ii) an electroluminescent panel utilising the above device; (iii) a cold cathode utilising the above device; and (iv) a photocathode utilising the above device. USE/ADVANTAGE - Esp. for diode lasers emitting in the visible and esp. towards the short wavelengths (e.g. for high density information storage, submarine optical communication, etc.), but also for electroluminescent diodes (for optically controlled display devices), cold cathodes and photocathodes. High charge carrier concns. can be introduced into wide bandgap (esp. II-VI) semiconductors without the problems of heavy doning (auto-compensation phenomenon) and contact with the wide bandgap materials.
机译:要求保护的装置具有用于将电荷载流子注入到难以通过掺杂而使其导电的大带隙材料中的装置,该装置包括:(a)具有恒定或部分增加的窄带隙E1的材料,形成自由电荷载流子(电子或空穴)源; (b)具有较大间隙R3的材料; (c)从E1到E3带隙连续连续增加的未掺杂材料; (d)一种施加电压以通过增加的带隙材料引起电荷载流子从窄带隙(E1)材料向宽带隙(E3)材料循环的装置。 (i)利用上述装置的可见光发射激光源; (ii)利用上述装置的电致发光面板; (iii)利用上述装置的冷阴极; (iv)利用上述装置的光电阴极。使用/优势-Esp。用于可见光和esp发射的二极管激光器。朝向短波长(例如用于高密度信息存储,海底光通信等),还用于电致发光二极管(用于光控显示设备),冷阴极和光电阴极。高电荷载体浓度。可以将其引入宽带隙(尤其是II-VI)半导体中,而不会出现过多的电荷(自动补偿现象)以及与宽带隙材料接触的问题。

著录项

  • 公开/公告号FR2696278A1

    专利类型

  • 公开/公告日1994-04-01

    原文格式PDF

  • 申请/专利权人 THOMSON CSF;

    申请/专利号FR19920011452

  • 发明设计人 SCHNELL JEAN-PHILIPPE;

    申请日1992-09-25

  • 分类号H01L21/365;H01L33/00;

  • 国家 FR

  • 入库时间 2022-08-22 04:33:45

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