首页>
外国专利>
Radiation-sensitive positive resist composition comprising an o- quinone diazide, an alkali-soluble resin and a polyphenol compound
Radiation-sensitive positive resist composition comprising an o- quinone diazide, an alkali-soluble resin and a polyphenol compound
展开▼
机译:辐射敏感性正型抗蚀剂组合物,其包含邻醌二叠氮化物,碱溶性树脂和多酚化合物
展开▼
页面导航
摘要
著录项
相似文献
摘要
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: ##STR1## wherein R is a C.sub.1 -C. sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.
展开▼