Radiation-sensitive positive resist composition comprising a 1,2- quinone diazide compound, an alkali-soluble resin and a polyphenol compound

摘要

A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:PPX--&agr;--H (I) P Pwherein x is a group of the formula: ##STR1## and &agr; is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub. 3 are the same or different and a C.sub.1 - C.sub.18 alkyl group, a C.sub. 1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 - C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.