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ECR plasma reaction apparatus having uniform magnetic field gradient
ECR plasma reaction apparatus having uniform magnetic field gradient
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机译:具有均匀磁场梯度的ECR等离子体反应装置
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摘要
A plasma reaction apparatus has main and auxiliary magnetic field generating coils for generating a magnetic field which has a gradient of no more than 50 gauss/cm in the axial direction and a difference between the axial magnetic field gradient and the magnetic field gradient ten centimeters from the axis of no more than 10 gauss/cm for processing a semiconductor substrate. The plasma reaction apparatus is able to generate a high density, uniform plasma so that the semiconductor substrate is uniformly processed at high speed.
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