MAGNETIC FIELD-PROVIDED MICROWAVE PLASMA PROCESSING DEVICE

摘要

PURPOSE: To suppress generation of particles by forming a shape of a side wall internal peripheral surface in a vacuum vessel almost parallelly to the direction of a line of magnetic force, so that plasma is diffused along the side wall internal peripheral surface of the vacuum vessel. ;CONSTITUTION: After an exhaust device is driven to exhaust a plasma production chamber 11 and a sample chamber 18 to a prescribed pressure, gas is introduced from gas introducing pipes 22a, 23a and a gas introducing path 15b, to set the chambers to a prescribed gas pressure. Next by flowing a current in excitation coils 17, a magnetic field is formed in the production chamber 11, and also a microwave is introduced to the production chamber 11 through a wave guide 16 and a microwave introducing port. Then in the production chamber 11, plasma is generated by a discharge, and a divergent magnetic field is formed by the coil 17 in a charged particle in the plasma. Since a line of magnetic force of this magnetic field is formed parallelly to the shape of a side wall internal peripheral surface 15a in a vaccum vessel, by preventing collision with each other, the plasma, without colliding against the internal peripheral surface 15a, is radiated to a sample S.;COPYRIGHT: (C)1995,JPO