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Effect of Magnetic Mirror Plasma Confinement on Microwave Electron Cyclotron Resonance/D.C. Discharge for Low Pressure Sputtering(Physics, Process, Instrument Measurements)

机译：电磁镜等离子体限制对微波电子回旋共振/直流电的影响低压溅射的放电（物理，过程，仪器和测量）

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MISINA Martin; SETSUHARA Yuichi; MIYAKE Shoji;
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年度 2013
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正文语种 eng
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1. Effect of Magnetic Mirror Plasma Confinement on Microwave Electron Cyclotron Resonance/D.C. Discharge for Low Pressure Sputtering [J] . Martin MISINA, Yuichi SETSUHARA, Shoji MIYAKE Transactions of JWRI . 1995,第2期

机译：电磁镜等离子体限制对微波电子回旋共振/直流电的影响低压溅射排放
2. Low temperature sputter-deposition of Ni-Zn ferrite thin-films using electron-cyclotron-resonance microwave plasma - soft magnetic backlayer for spinel ferrite thin-film perpendicular magnetic recording media [J] . Hirofumi Wada, Setsuo Yamamoto, Hiroki Kurisu, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2002,第423期

机译：电子回旋共振微波等离子体低温溅射沉积镍锌铁氧体薄膜-尖晶石铁氧体薄膜垂直磁记录介质的软磁背层
3. Low temperature sputter-deposition of Ni-Zn ferrite thin-films using electron-cyclotron-resonance microwave plasma - soft magnetic backlayer for spinel ferrite thin-film perpendicular magnetic recording media [J] . Hirofumi Wada, Setsuo Yamamoto, Hiroki Kurisu, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2002,第423期

机译：使用电子 - 回旋 - 谐振微波等离子体 - 软磁背光用于尖晶石铁氧体薄膜垂直磁记录介质的低温溅射沉积镍铬镍薄膜
4. Magnetic Confinement of Plasmas Generated by Coaxial Twinned Electron Cyclotron Resonance (ECR) Discharge [C] . Gengshun Chen, Ruihong Tong, Anhua Zhang ICMSEA 2012 . 2012

机译：同轴孪晶电子回火（ECR）放电产生的等离子体的磁禁闭
5. Characterization of argon electron-cyclotron-resonance-heated mirror plasmas for materials processing applications. [D] . Junck, Kevin Lee. 1991

机译：用于材料加工应用的氩电子回旋共振共振镜面等离子体的表征。
6. Low Temperature Synthesis of SrTiO_3 Films by Mirror Confinement Type ECR Plasma Sputtering(Physics, Processes, Instruments Measurements) [O] . BABA So, UENO Toshiyuki, MIYAKE Shoji 2013

机译：镜面限制型ECR等离子溅射低温合成SrTiO_3薄膜（物理，过程，仪器与测量）
7. Poly-Si etching using an electron cyclotron resonance microwave plasma sources with multipole confinement. [R] . S. M. Gorbatkin L. A. Berry J. Swyers 1991

机译：使用具有多极限制的电子回旋共振微波等离子体源的多晶硅蚀刻。

Effect of Magnetic Mirror Plasma Confinement on Microwave Electron Cyclotron Resonance/D.C. Discharge for Low Pressure Sputtering(Physics, Process, Instrument Measurements)

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