首页> 外国专利> Test structure for measuring misalignment between levels in microelectronic technologies, based mos transistors triangular door

Test structure for measuring misalignment between levels in microelectronic technologies, based mos transistors triangular door

机译:用于测量微电子技术中水平之间未对准的测试结构,基于mos晶体管三角门

摘要

THE STRUCTURE OF TEST FOR THE MEASUREMENT misalignment between LEVELS OF TECHNOLOGIES MicroImager, BASED TRANSISTORS MOS DOOR TRIANGULAR IS A microelectronic device comprising four MOS transistors WITH DOOR TRIANGULAR, arranged at 90 EACH, WITH TERMINALS SOURCE STATES, SENSIBLE misalignment between levels DOOR AND ACTIVE AREAS IN TECHNOLOGY self-aligned. Misalignment OBTAINED FROM THE EXTENT OF CURRENT IN EACH CHANNEL TRANSISTORS, polarize them in the linear region or in the saturation.
机译:基于晶体管的技术MicroImager的水平之间的测量失准的测试结构MOS门三角形是一种微电子器件,包括四个具有门三角形的MOS晶体管,每个90个,其端子源状态,门和活动级之间的合理失准技术自我调整。从每个通道晶体管的电流范围中发现不对中,将它们在线性区域或饱和度中极化。

著录项

  • 公开/公告号ES2042382R

    专利类型

  • 公开/公告日1995-08-16

    原文格式PDF

  • 申请/专利权人

    申请/专利号ES19910002409

  • 发明设计人

    申请日1991-10-30

  • 分类号G01R31/26;G01R31/30;H01L21/72;

  • 国家 ES

  • 入库时间 2022-08-22 04:16:54

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号