Method for selectively etching diamond (PROCESS FOR SELECTIVELY ETCHING DIAMOND)

摘要

A method of selectively etching a diamond substrate comprises forming a graphite region in the diamond substrate and forming a diamond layer on the diamond substrate as a gaseous reactant under conditions sufficient to substantially change the graphite region to a gaseous product while substantially avoiding reaction of the diamond substrate with the diamond. And selectively etching the substrate. Technique can be used, for example, to form a single crystal diamond layer using a lift-off technique.