X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X- ray mask structure

摘要

The present invention provides an X-ray mask structure a production method thereof, and an exposure method therefor, whereby patterns can be formed faithfully to designed device line widths regardless of the thickness distribution of an X-ray transmissive membrane. The present invention also provides a device exhibiting stable and high performance fabricated by means the X-ray mask structure. In accordance with the present invention, the X-ray mask structure comprises X-ray absorbers, an X-ray transmissive membrane for supporting the X-ray absorbers, and a supporting frame for supporting the X-ray transmissive membrane, wherein the line widths of the X-ray absorbers are compensated corresponding to the thickness distribution of the X-ray transmissive membrane so that the deviation of the line widths of transferred patterns from the desired line widths of the patterns may be cancelled. A method for producing the X-ray mask structure, an exposure method using the X- ray mask structure, and a device fabricated by use of the X-ray mask structure are also disclosed.