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Rotary-type wafer drying apparatus with anti-deflection cover
Rotary-type wafer drying apparatus with anti-deflection cover
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机译:带有防偏盖的旋转式晶圆干燥装置
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摘要
A rotary-type wafer drying apparatus includes a deflection prevention protecting plate attached to a cradle for a wafer, for diminishing rebounding of dewaterized water. A free side of the protecting plate in the cradle containing wafer maintains an appropriate angle with the cradle and the transverse length of the plate is longer than the transverse length of the radially outward side of the cradle.
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