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DIAMINE COMPOUND, HEAT-RESISTANT POLYMER PRECURSOR, HEAT-RESISTANT POLYMER PRECURSOR COMPOSITION, AND HEAT RESISTANT POLYMER

机译:二胺化合物,耐热聚合物前体,耐热聚合物前体组成和耐热聚合物

摘要

PURPOSE: To obtain a heat-resistant polymer precursor excellent in the adhesion to a sealing resin and suited for use as a protective film for a semiconductive element, etc., by polymerizing a specific diamine compound mixture with a 6C or higher acid dianhydride. ;CONSTITUTION: A diamine compound mixture containing at least 5mol% diamine compound represented by formula I, II, or III (wherein A is COO, NHCOO, or NHCONH; R6 is a 4C or lower alkyl or phenyl; and (k) is 2-4) is polymerized with a 6C or higher acid dianhydride (e.g. 3,3',4,4'-biphenyltetracarboxylic dianhydride) to produce a heat-resistant polymer precursor. To this precursor are added necessary additives such as an amine compound having a carbon- carbon double bond, a sensitizer, a sensitizer aid, and a solvent. This composition is used for forming a film for covering a semiconductor chip, etc.;COPYRIGHT: (C)1996,JPO
机译:用途:通过将特定的二胺化合物混合物与6C或更高的酸二酐聚合,可获得对密封树脂的粘合性优异并且适合用作半导体元件等的保护膜的耐热聚合物前体。 ;组成:含有至少5mol%的由式I,II或III表示的二胺化合物的二胺化合物混合物(其中A为COO,NHCOO或NHCONH; R 6 为4C或低级烷基或苯基;(k)为2-4)与6C或更高的酸二酐(例如3,3',4,4'-联苯四甲酸二酐)聚合,以生产耐热聚合物前体。向该前体中添加必要的添加剂,例如具有碳-碳双键的胺化合物,敏化剂,敏化助剂和溶剂。该组合物用于形成覆盖半导体芯片等的膜。版权所有:(C)1996,日本特许厅

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